Skip to end of metadata
Go to start of metadata

You are viewing an old version of this page. View the current version.

Compare with Current View Page History

Version 1 Next »



Node Location: Material

Description

This node will detect the areas of shadow in an input colour map and generate a mask to aid in the removal of it, or to facilitate the adjustment of these areas. 
It can be supplemented with the addition of a scanned height map for added accuracy.

Once satisfied with the mask created pressing the Remove Shadows button will fill these areas with relevant information.

Parameters

Inputs: 
    • Color Bitmap:
      Node accepts single bitmaps
    • Height Map:
      A baked height map sourced from scans can add accuracy to result

  • Properties:
    • Threshold:
      This slider will adjust the generated mask. Larger values will encompass wider areas of shadow


How to use

 Step by step guide

Content aware fill allows you to fill in areas of your inputs in a smart way. If there are areas/features you want to remove, just paint a mask over them and run the content aware fill node.


  1. Add input bitmap or material to the node graph

  2. Connect the input to the first port on the Content-Aware Fill node

  3. Connect a binary mask to the 'Fill Mask' port on the Content-Aware Fill node

  4. Select the feathering (area that will be impacted by the content aware fill (values are in pixels)

  5. Execute the node


With the use of the mask paint node you can manually create your own masks. How a structure guide mask and a fill mask should be created are covered there.








  • No labels